NexZM: Wafer and Die Measurement System

NexZM Has Applications In:

  • Wafer Inspection System
  • Thin Flim Metrology
  • Mask Inspection System
  • Bump Inspection
  • Package Inspection
  • Lead Frame Inspection
  • Probe Card Inspection
  • Solar Panel Inspection

Wafer Inspection System

  • Detects defects like scratches, particles, and pattern anomalies at wafer level.
  • Ensures high yield by identifying issues early in the process.
  • Supports both front-end and back-end semiconductor fabs.

Mask Inspection System

  • Analyzes photomasks for defects that could transfer onto wafers.
  • Ensures lithography accuracy and pattern fidelity.
  • Improves device performance by maintaining defect-free masks.

⁠Thin Film Metrology

  • Measures film thickness, refractive index, and uniformity
  • Ensures process control in deposition and etching steps.
  • Critical for advanced nodes requiring precise layer stacking.

Bump Inspection

  • Inspects solder bumps for size, height, and shape uniformity.
  • Detects missing, bridged, or deformed bumps.
  • Essential for flip-chip and advanced packaging reliability.

Package Inspection

  • Verifies package integrity, alignment, and surface quality.
  • Detects cracks, voids, and contamination.
  • Enhances reliability for consumer, automotive, and high-performance chips.

Lead Frame Inspection

  • Checks alignment, warpage, and dimensional accuracy of lead frames.
  • Ensures proper die attachment and wire bonding quality.
  • Prevents electrical and mechanical failures in packaged ICs.

Probe Card Inspection

  • Monitors probe tip wear, alignment, and contamination.
  • Ensures accurate electrical contact during wafer testing.
  • Extends probe card lifespan and reduces false test failures.

Solar Panel Inspection

  • Detects micro-cracks, cell misalignment, and surface defects.
  • Evaluates uniformity of coatings and metallization.
  • Improves efficiency and reliability of photovoltaic modules.

Technical Specifications

ParameterSpecification
ModelNexZM@
Measurement Area (X,Y)300 × 300 mm
Overall Dimensions (mm)2610 × 1400 × 2030
Stage X/Y Positioning Accuracy≤ 80 µm
Stage Flatness≤ 50 µm
Stage Leveling≤ 50 µm

Key Features

  • Guarantees absolute accuracy, reproducibility, and system-to-system matching across fabs.
  • SECS/GEM protocol compliant, ensuring smooth fab integration.
  • Capable of thickness, surface roughness, and warpage measurement.
  • Compatible with server or desktop, offering easy integration with external systems using Industrial Ethernet and Modbus TCP/IP interfaces.